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Biomedical subjects

Irving P Herman

Publications and source records attributed to Irving P Herman.

3 recordsLinked to original sources

Exciton polarizability in semiconductor nanocrystals.

The response of charge to externally applied electric fields is an important basic property of any material system, as well as one critical for many applications. Here, we examine the behaviour and dynamics of charges fully confined on the nanometre length scale. This is accomplished using CdSe nanocrystals of controlled radius (1-2.5 nm) as prototype quantum systems. Individual electron-hole pairs are created at room temperature within these structures by photoexcitation and are probed by terahertz (THz) electromagnetic pulses. The electronic response is found to be instantaneous even for THz frequencies, in contrast to the behaviour reported in related measurements for larger nanocrystals and nanocrystal assemblies. The measured polarizability of an electron-hole pair (exciton) amounts to approximately 10(4) A(3) and scales approximately as the fourth power of the nanocrystal radius. This size dependence and the instantaneous response reflect the presence of well-separated electronic energy levels induced in the system by strong quantum-confinement effects.

Journal Article↗

Raman microprobe analysis of elastic strain and fracture in electrophoretically deposited CdSe nanocrystal films.

The mechanical stability of nanocrystal films is critical for applications, yet largely unexplored. Raman microprobe analysis used here to probe the nanocrystal cores of thick, fractured electrophoretically deposited films of 3.2 nm diameter CdSe nanocrystals measures approximately 2.5% in-plane tensile strain in cores of unfractured films. The crack dimensions determine the overall in-plane film strain, approximately 11.7%, and the film biaxial modulus, approximately 13.8 GPa, from which the biaxial modulus of the trioctylphosphine oxide ligand matrix is inferred, approximately 5.1 GPa.

Cadmium Compounds↗

Optical diagnostics for thin film processing.

Optical diagnostics are used to probe the plasma or neutral gas above the substrate, particles in the gas or on the surface, the film surface and reactor walls, the film itself, and the substrate during thin film processing. The development and application of optical probes are highlighted, in particular for analyzing plasma/gas phase intermediates and products and film composition, and performing metrology, thermometry, and endpoint detection and control. Probing etching (particularly plasma etching) and deposition (particularly epitaxy) are emphasized.

Journal Article↗