Emission-depth-selective auger photoelectron coincidence spectroscopy.
The collision statistics of the energy dissipation of Auger and photoelectrons emitted from an amorphized Si(100) surface is studied by measuring the Si 2p photoelectron line as well as the first plasmon loss peak in coincidence with the Si-LVV Auger transition and the associated first plasmon loss. The Si 2p plasmon intensity decreases when measured in coincidence with the Si-LVV peak. If measured in coincidence with the Si-LVV plasmon the decrease is significantly smaller. The results agree quantitatively with calculations accounting for surface, volume, and intrinsic losses as well as elastic scattering in a random medium. In this way one can determine the average emission depth of individual electrons by means of Auger photoelectron coincidence spectroscopy, which therefore constitutes a unique tool to investigate interfaces at the nanoscale level.