Dynamic scaling method and interface growth.
The dynamic scaling approach is an important tool for describing the time evolution of rough interfaces. It computes dynamic scaling parameters alpha and beta, which characterize surface and time correlations. Applications of dynamic scaling to random deposition and ballistic deposition are discussed. A model of random adsorption on fractal substrates is presented. Then the influence of surface diffusion on adsorption is analyzed. The dependence of alpha and beta on the substrate fractal dimension, together with the dependence of the fractal dimension of the gas-solid interface on adsorption coverage are computed.
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