Biomedical subjects

D A Muller

Publications and source records attributed to D A Muller.

12 recordsLinked to original sources

PubMed2006

Subtleties in ADF imaging and spatially resolved EELS: A case study of low-angle twist boundaries in SrTiO3.

A screw dislocation network at the low-angle SrTiO3/Nb:SrTiO3 twist grain boundary has been analyzed by annular dark field (ADF) imaging and spatially resolved electron energy loss spectroscopy (EELS) in a scanning transmission electron microscope (STEM). The cores of one set of dislocations running parallel to the beam direction appear dark in the ADF STEM images. EELS on the dislocation core reveals a reduced Sr/Ti ratio compared to the bulk suggesting Sr-deficient cores. The second set of dislocations, orthogonal to the latter, is imaged by its strain field using low-angle annular dark field (LAADF) imaging. Multislice image simulations suggest channeling of the electron probe on the atomic columns for small tilts, theta < 1 degree, where the Sr columns act as beam guides. Only for larger tilts is the channeling effect strongly reduced and the fringe contrast approaches the value predicted by a purely incoherent imaging model. Ti-L(2,3) EELS across the dislocation core shows an asymmetry between the EELS and the ADF signal which cannot be explained by the geometry or beam broadening. This asymmetry might be explained by an effective nonlocal potential representing inelastic scattering in EELS.

Journal Article↗

PubMed2004

Depth-dependent imaging of individual dopant atoms in silicon.

We have achieved atomic-resolution imaging of single dopant atoms buried inside a crystal, a key goal for microelectronic device characterization, in Sb-doped Si using annular dark-field scanning transmission electron microscopy. In an amorphous material, the dopant signal is largely independent of depth, but in a crystal, channeling of the electron probe causes the image intensity of the atomic columns to vary with the depths of the dopants in each column. We can determine the average dopant concentration in small volumes, and, at low concentrations, the depth in a column of a single dopant. Dopant atoms can also serve as tags for experimental measurements of probe spreading and channeling. Both effects remain crucial even with spherical aberration correction of the probe. Parameters are given for a corrected Bloch-wave model that qualitatively describes the channeling at thicknesses 20 nm, but does not account for probe spreading at larger thicknesses. In thick samples, column-to-column coupling of the probe can make a dopant atom appear in the image in a different atom column than its physical position.

Computer Simulation↗

PubMed2004

The formation of clusters and nanocrystals in er-implanted hexagonal silicon carbide.

Impurity atom cluster and nanocrystal formation in Er-implanted hexagonal SiC were studied using TEM and HAADF-STEM. Short interstitial loops were initially observed to form in the as-implanted layers. After annealing at 1600 degrees C extended matrix defects (wide interstitial loops and voids), Er atom clusters and nanocrystals grew. The wide interstitial loops act as strong sinks capturing diffusing dopants that gather first in lines, then planes, and finally in three-dimensional ErSi2 nanocrystals. The unstrained nanocrystals have a hill-like shape and only two polarity-dependent orientations with respect to the matrix. One-, two-, and three-dimensional Er atom clusters were also identified. For the case of Ge implantation, again the wide interstitial loops act as sinks for the implanted Ge, representing the seeds of the nanocrystal.

Carbon Compounds, Inorganic↗

PubMed2003

Evidence for a new class of defects in highly n-doped Si: donor-pair-vacancy-interstitial complexes.

Electron channeling experiments performed on individually scanned, single columns of atoms show that in highly n-type Si grown at low temperatures the primary electrically deactivating defect cannot belong to either the widely accepted class of donor-vacancy clusters or a recently proposed class of donor pairs. First-principles calculations suggest a new class of defects consisting of two dopant donor atoms near a displaced Si atom, which forms a vacancy-interstitial pair. These complexes are consistent with the present experimental results, the measured open volume of the defects, the observed electrical activity as a function of dopant concentration, and the enhanced diffusion of impurities in the presence of deactivated dopants.

Journal Article↗

PubMed2003

Imaging individual atoms inside crystals with ADF-STEM.

The quantitative imaging of individual impurity atoms in annular dark-field scanning transmission electron microscopy (ADF-STEM) requires a clear theoretical understanding of ADF-STEM lattice imaging, nearly ideal thin samples, and careful attention to image processing. We explore the theory using plane-wave multislice simulations that show the image intensity of substitutional impurities is depth-dependent due to probe channeling, but the intensity of interstitial impurities need not be. The images are only directly interpretable in thin samples. For this reason, we describe a wedge mechanical polishing technique to produce samples less than <50 A thick, with low surface roughness and no amorphous surface oxide. This allows us to image individual dopants as they exist within a bulk-like silicon environment. We also discuss the image analysis techniques used to extract maximum quantitative information from the images. Based on this information, we conclude that the primary nanocluster defect responsible for the electrical inactivity of Sb in Si at high concentration consists of only two atoms.

Journal Article↗

PubMed2003

Thin dielectric film thickness determination by advanced transmission electron microscopy.

High-resolution transmission electron microscopy (HR-TEM) has been used as the ultimate method of thickness measurement for thin films. The appearance of phase contrast interference patterns in HR-TEM images has long been confused as the appearance of a crystal lattice by nonspecialists. Relatively easy to interpret crystal lattice images are now directly observed with the introduction of annular dark-field detectors for scanning TEM (STEM). With the recent development of reliable lattice image processing software that creates crystal structure images from phase contrast data, HR-TEM can also provide crystal lattice images. The resolution of both methods has been steadily improved reaching now into the sub-Angstrom region. Improvements in electron lens and image analysis software are increasing the spatial resolution of both methods. Optimum resolution for STEM requires that the probe beam be highly localized. In STEM, beam localization is enhanced by selection of the correct aperture. When STEM measurement is done using a highly localized probe beam, HR-TEM and STEM measurement of the thickness of silicon oxynitride films agree within experimental error. In this article, the optimum conditions for HR-TEM and STEM measurement are discussed along with a method for repeatable film thickness determination. The impact of sample thickness is also discussed. The key result in this article is the proposal of a reproducible method for film thickness determination.

Image Processing, Computer-Assisted↗

PubMed2002

Artificial charge-modulationin atomic-scale perovskite titanate superlattices.

The nature and length scales of charge screening in complex oxides are fundamental to a wide range of systems, spanning ceramic voltage-dependent resistors (varistors), oxide tunnel junctions and charge ordering in mixed-valence compounds. There are wide variations in the degree of charge disproportionation, length scale, and orientation in the mixed-valence compounds: these have been the subject of intense theoretical study, but little is known about the microscopic electronic structure. Here we have fabricated an idealized structure to examine these issues by growing atomically abrupt layers of LaTi(3+)O(3) embedded in SrTi(4+)O(3). Using an atomic-scale electron beam, we have observed the spatial distribution of the extra electron on the titanium sites. This distribution results in metallic conductivity, even though the superlattice structure is based on two insulators. Despite the chemical abruptness of the interfaces, we find that a minimum thickness of five LaTiO(3) layers is required for the centre titanium site to recover bulk-like electronic properties. This represents a framework within which the short-length-scale electronic response can be probed and incorporated in thin-film oxide heterostructures.

Journal Article↗

PubMed2002

Atomic-scale imaging of individual dopant atoms and clusters in highly n-type bulk Si.

As silicon-based transistors in integrated circuits grow smaller, the concentration of charge carriers generated by the introduction of impurity dopant atoms must steadily increase. Current technology, however, is rapidly approaching the limit at which introducing additional dopant atoms ceases to generate additional charge carriers because the dopants form electrically inactive clusters. Using annular dark-field scanning transmission electron microscopy, we report the direct, atomic-resolution observation of individual antimony (Sb) dopant atoms in crystalline Si, and identify the Sb clusters responsible for the saturation of charge carriers. The size, structure, and distribution of these clusters are determined with a Sb-atom detection efficiency of almost 100%. Although single heavy atoms on surfaces or supporting films have been visualized previously, our technique permits the imaging of individual dopants and clusters as they exist within actual devices.

Journal Article↗

PubMed2002

Fluctuation microscopy in the STEM.

Fluctuation electron microscopy is a technique for studying medium-range order in disordered materials. We present an implementation of fluctuation microscopy using nanodiffraction in a scanning transmission electron microscope (STEM) at a spatial resolution varying from 0.8 to 5.0 nm. Compared to conventional TEM (CTEM), the STEM-based technique offers a denser scattering vector sampling at a reduced sample dose and easier access to variable resolution information. We have reproduced results on amorphous silicon previously obtained by CTEM-based fluctuation microscopy, and report initial variable-resolution measurements on amorphous germanium.

Journal Article↗

PubMed2002

Direct observation of defect-mediated cluster nucleation.

Ion implantation is widely used to introduce electrically or optically active dopant atoms into semiconductor devices. At high concentrations, the dopants can cluster and ultimately form deactivating precipitates, but deliberate nanocrystal formation offers an approach to self-assembled device fabrication. However, there is very little understanding of the early stages of how these precipitates nucleate and grow, in no small part because it requires imaging an inhomogenous distribution of defects and dopant atoms buried inside the host material. Here we demonstrate this, and address the long-standing question of whether the cluster nucleation is defect-mediated or spontaneous. Atomic-resolution illustrations are given for the chemically dissimilar cases of erbium and germanium implanted into silicon carbide. Whereas interstitial loops act as nucleation sites in both cases, the evolution of nanocrystals is strikingly different: Erbium is found to gather in lines, planes and finally three-dimensional precipitates, whereas germanium favours compact, three-dimensional structures.

Carbon Compounds, Inorganic↗

PubMed2001

Simulation of thermal diffuse scattering including a detailed phonon dispersion curve.

Thermal vibration of the atoms in a crystal give rise to a diffuse background in the diffraction pattern (in between the normal allowed Bragg reflections). The Einstein model for phonon vibrations in a crystal leads to Gaussian statistics for the phonons. However, the Einstein model ignores the possibility of correlation between the atoms. An accurate model of the phonon dispersion curves for silicon is used to generate a set of more accurate random atomic displacements. These displacements are used in a multislice-style simulation to gauge the validity of the Einstein approximation. The phonon dispersion curve yields a small additional oscillatory structure in the thermal diffuse scattering (TDS) pattern. This does not produce significant changes in the annular dark field scanning transmission electron microscope (ADF-STEM) image signal, but could have a large impact on convergent beam measurements of bond charges.

Journal Article↗

PubMed2001

Optimizing the environment for sub-0.2 nm scanning transmission electron microscopy.

Sub-0.2 nm probes can now be readily obtained on Schottky field-emission microscopes. However, environmental instabilities are proving to be the limiting factors for atomic resolution spectroscopy and distortion-free annular-dark field imaging. This is a result of the long acquisition times and the serial nature of the scanning system where instabilities result in image distortions rather than reductions in contrast. Troubleshooting the most common environmental problems is discussed here. In addition to the expected sensitivity to mechanical vibration, electromagnetic interference and temperature variations, air-pressure fluctuations are found to have a significant impact on microscopes with side-entry goiniometers.

Journal Article↗