Biomedical subjects

Anton Barty

Publications and source records attributed to Anton Barty.

3 recordsLinked to original sources

PubMed2007

Validation of radiographic simulation codes including x-ray phase effects for millimeter-size objects with micrometer structures.

The mix between x-ray phase and attenuation information needs to be understood for accurate object recovery from radiography and tomography data. We are researching and experimentally validating algorithms that simulate x-ray phase contrast to determine the required physics necessary for quantitative object recovery. The results of a study are described to determine if a multislice (beam-propagation) method is required for simulating x-ray radiographs. We conclude that the multislice method is not required for accurate simulation of greater than or equal to 8 keV x-ray radiographs of millimeter-size objects with micrometer structures.

Algorithms↗

PubMed2006

High-resolution ab initio three-dimensional x-ray diffraction microscopy.

Coherent x-ray diffraction microscopy is a method of imaging nonperiodic isolated objects at resolutions limited, in principle, by only the wavelength and largest scattering angles recorded. We demonstrate x-ray diffraction imaging with high resolution in all three dimensions, as determined by a quantitative analysis of the reconstructed volume images. These images are retrieved from the three-dimensional diffraction data using no a priori knowledge about the shape or composition of the object, which has never before been demonstrated on a nonperiodic object. We also construct two-dimensional images of thick objects with greatly increased depth of focus (without loss of transverse spatial resolution). These methods can be used to image biological and materials science samples at high resolution with x-ray undulator radiation and establishes the techniques to be used in atomic-resolution ultrafast imaging at x-ray free-electron laser sources.

Algorithms↗

PubMed2004

Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam.

We present a method for repairing defects near the top surfaces of multilayer coatings in general and specifically on extreme-ultraviolet lithography mask blanks. Milling away the defect and a surrounding region of the multilayer by use of a focused ion beam can repair both the reflectivity and the phase of the reflected light in the vicinity of such a defect. We describe the conditions under which the repaired region will not itself be a defect and experimentally demonstrate the feasibility of this multilayer repair technique. The results described are also applicable to understanding and controlling the optical effects of ion-induced multilayer erosion.

Journal Article↗