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Ampere A Tseng

Publications and source records attributed to Ampere A Tseng.

3 recordsLinked to original sources

Recent developments in nanofabrication using ion projection lithography.

Ion projection lithography (IPL) is an emerging technology and a major candidate for the next-generation lithography (NGL) designed to complement and supplement current optical lithographic techniques for future chip manufacturing. In this Review, the recent developments of IPL technology are examined with an emphasis on its ability to fabricate a wide variety of nanostructures for the semiconductor industry. Following an introduction of the uniqueness and strength of the technology, the basics of ion-source development and ion-target interactions with and without chemical enhancement are presented. The developments in equipment systems, masks, and resists are subsequently studied. The resolution of printed nanostructures and the corresponding throughput of the current system are assessed for NGL. Finally, concluding remarks are presented to summarize the strengths and weaknesses of the current technology and to suggest the scope for future improvement.

Elasticity↗

Recent developments in nanofabrication using focused ion beams.

Focused ion beam (FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB-based nanofabrication involves four major approaches: milling, implantation, ion-induced deposition, and ion-assisted etching of materials; all these approaches are reviewed separately. Following an introduction of the uniqueness and strength of the technology, the ion source and systems used for FIB are presented. The principle and specific techniques underlying each of the four approaches are subsequently studied with emphasis on their abilities of writing structures with nanoscale accuracy. The differences and uniqueness among these techniques are also discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technological improvement and future research are recommended.

Carbon↗

Nanoscale fabrication by nonconventional approaches.

An overview of three major nonconventional approaches in nanofabrication, scanning probe microscopy lithography, self-assembly, and imprint lithography, is presented. Typically, these nonconventional approaches are emerging technologies based on simple principles with potential cost-effective manufacturability, as compared to those conventional processes that are widely used and highly developed for making microelectronic circuits. Following the introduction of nonconventional technologies and their significances in nanofabrication, the details of each approach are presented. The lithographic applications of scanning probe microscopy, which involves three major variations: scanning tunneling microscopy, atomic force microscopy, and scanning near-field optical microscopy, are first evaluated with emphasis on their abilities in making structures with subnanoscale resolutions. The principles and processes for each technique are presented while their differences are also discussed. For the second approach, self-assembly, which uses a bottom-up fabrication strategy, is reported starting with an introduction of its basic principle. Self-assembly, with and without externally controlled forces for patterning nanoscale structures, is then examined. The associated principles and procedures of key assembling processes are presented. The third one, imprint lithography, is addressed with an emphasis on its recent progress and challenges. The nanolithographic abilities of different techniques developed using the general imprinting principle are examined. Finally, concluding remarks are provided to summarize the major technologies studied and to recommend the scopes for technology improvement and future research.

Crystallization↗