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Biomedical subjects

Aimo Winkelmann

Publications and source records attributed to Aimo Winkelmann.

3 recordsLinked to original sources

Many-beam dynamical simulation of electron backscatter diffraction patterns.

We present an approach for the simulation of complete electron backscatter diffraction (EBSD) patterns where the relative intensity distributions in the patterns are accurately reproduced. The Bloch wave theory is applied to describe the electron diffraction process. For the simulation of experimental patterns with a large field of view, a large number of reflecting planes has to be taken into account. This is made possible by the Bethe perturbation of weak reflections. Very good agreement is obtained for simulated and experimental patterns of gallium nitride GaN{0001} at 20kV electron energy. Experimental features like zone-axis fine structure and higher-order Laue zone rings are accurately reproduced. We discuss the influence of the diffraction of the incident beam in our experiment.

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Perpendicular magnetic anisotropy induced by tetragonal distortion of FeCo alloy films grown on Pd(001).

We grew tetragonally distorted FexCo1-x alloy films on Pd(001). Theoretical first-principles calculations for such films predicted a high saturation magnetization and a high uniaxial magnetic anisotropy energy for specific values of the lattice distortion c/a and the alloy composition x. The magnetic anisotropy was investigated using the magneto-optical Kerr effect. An out-of-plane easy axis of magnetization was observed for Fe0.5Co0.5 films in the thickness range of 4 to 14 monolayers. The magnetic anisotropy energy induced by the tetragonal distortion is estimated to be almost 2 orders of magnitude larger than the value for bulk FeCo alloys. Using LEED Kikuchi patterns, a change of the easy axis of magnetization can be related to a decrease of the tetragonal distortion with thickness.

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Dynamical simulations of zone axis electron channelling patterns of cubic silicon carbide.

We have observed and simulated energy-dependent intensity distributions in electron channelling patterns (ECP) of cubic silicon carbide (3C SiC) which were recorded close to the (111) zone axis. The kinetic energies used were in the range from 4 to 8 keV, covering the low-energy region of the ECP technique. We explain the observed patterns by dynamical many beam simulations using a bloch wave approach for the diffraction of the incoming beam and the forward-backward-approximation for the backscattering of the electrons. The dynamical simulations reproduce the experimental patterns very well. It is found that higher-order Laue zone reflections are responsible for the strong energy sensitivity of the intensity distributions.

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